EXPERIENCE

Process Experience

• Process control, monitoring and stability
  
• Recipe generation and optimization
  
• Defectivity reduction and yield gain
  
• DoE for process control and improvement according to technology needs
  
• Continuous improvement for process and productivity gain
  
• Process- and technology transfer and documentation

Methodology

PUBLICATIONS

[1] J.S. Zeakes, D.W. Franke, J. Neumann, T. Breeden, "Pilot Production at SEMICONDUCTOR300", Proceedings of the XIII International Ion Implant Technology Conference, pp. 360-363 (2001).

[2] D.-W. Franke, M. Schmeide, H. M. Brüssow, F. Hundt, E. Trepte, "Tool matching by using single wafer implanter Varian VIISta80 and batch implanter Axcelis HC3 for high current applications", Proceedings of the XV International Ion Implant Technology Conference, pp. 102-106 (2005).

[3] D.-W. Franke, F. Hundt, T. Guenther, M. Schmeide, C. E. Ferrell, B. Krimbacher, R. Reece, J. Grant, F. Haerting, "Defectivity reduction and control in ion implant systems through hardware and process optimization", Proceedings of the XVI International Ion Implant Technology Conference, pp. 441-444 (2006)

[4] M. Schmeide, M. Kokot, D.-W. Franke, B. Sauter, "Detection and reduction of the yield impact of particle induced structure defects at batch ion implanters", Proceedings of the XVI International Ion Implant Technology Conference, pp. 562-565 (2006).

ORAL PRESENTATIONS

[1] J.S. Zeakes, D.-W. Franke, "Fab Performance with 300 mm high energy implanter", Axcelis IICon November 1999 Napa Valley CA USA

[2] J.S. Zeakes, D.-W. Franke, "Pilot Production at SEMICONDUCTOR300", XIII International Ion Implant Technology Conference, 17-22 September 2000, Alpbach, Austria.

[3] D.-W. Franke, Ron Hoyer,"Semiconductor300 A story of success for manufacturing 300 mm wafers and advanced trends ",Axcelis IICon November 2001San Diego CA USA
[4] D.-W. Franke, "Using Single Wafer and Batch Implanter for high Current Applications", 31. German Users Group Meeting Ion Implantation November 2003 Erlangen, Germany

[5] D.-W. Franke, "Using Single wafer and batch implanter for 300 mm high current applications", Varian European Userseminar September 2004 Bad Schliersee, Germany

[6] D.-W. Franke, "First Experience by running 1 Scan Single Implants and 4 Pass Quad Implants on VIISta810 in a Production Environment" Varian European Userseminar September 2004 Bad Schliersee, Germany

[7] D.-W. Franke, "Modification of VIISta Implanters for productivity gain", Varian European User Seminar September 2005 Lyon, France

[8] D.-W. Franke, "Alternative Gassysteme", 35. German Users Group Meeting Ion Implantation May 2006 Erlangen, Germany

[9] D.-W. Franke, "Particle Performance of high current implanters", Varian European Userseminar September 2006 Dresden, Germany

[10] D.-W. Franke, "Temperaturkontrolle beim Ultra Fast Anneal" 28. German Users Group Meeting RTP November 2010 Reutlingen, Germany

[11] D.-W. Franke, "Ultra Fast Anneal in a Production Environment", 29. German Users Group Meeting RTP May 2011 Erlangen, Germany

[12] D.-W. Franke, "ION DOPING", 57. German Users Group Meeting Ion Implantation March 2017 Erfurt, Germany

POSTER PRESENTATIONS

[1] D.-W. Franke, M. Schmeide, H. M. Brüssow, F. Hundt, E. Trepte, "Tool matching by using single wafer implanter Varian VIISta80 and batch implanter Axcelis HC3 for high current applications", XV International Ion Implant Technology Conference, 25-27 October 2004, Taipei, Taiwan. (Poster award)

[2] M. Schmeide, M. Kokot, D.-W. Franke, B. Sauter, "Detection and reduction of the yield impact of particle induced structure defects at batch ion implanters", XVI International Ion Implant Technology Conference, 11-16 June 2006, Marseille, France. (Poster award)

[3] D.-W. Franke, F. Hundt, T. Guenther, M. Schmeide, C. E. Ferrell, B. Krimbacher, R. Reece, J. Grant, F. Haerting, "Defectivity reduction and control in ion implant systems through hardware and process optimization", XVI International Ion Implant Technology Conference, 11-16 June 2006, Marseille, France.